Kinetic Modeling and Experimental Studies of Large-Scale Low-Pressure RF Discharges
نویسنده
چکیده
A recent trend in plasma etching of semi-conductors has been the move towards discharge operation at low pressures of 2-20 mTorr. At these conditions the electron distribution functions shows modest but signi cant deviations from a fully nonlocal distribution. We have developed a model which addresses this regime of modest deviations from the nonlocal case with an efcient numerical scheme to solve the Boltzmann equation. Theoretical results are compared to results of two-dimensional Langmuir probe measurements. The measurements con rm the main assumptions used in our plasma model and show good agreement with the results of our model. Typeset using REVTEX 1
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